Titanium nitride films were deposited by the methods of ion beam enhanced deposition (IBED), plasma chemical vapor deposition (PCVD) and ion plating (IP). X-ray diffraction analysis was employed to determine the internal stress state of TiN film and 52100 steel substrate at both sides of the interface. The effect of stress state on their bonding strength and tribological behavior was analyzed systematically, their wear and failure mechanisms were discussed in detail as well.
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