The role of surface roughness on the coefficient of friction and wear of polished CVD diamond films has been investigated. Diamond films grown on single crystal silicon (001) substrates by Hot Filament Chemical Vapor Deposition (HFCVD) process were polished by a chemomechanical process in which a diamond film was polished against another diamond film in the presence of a fused alkaline oxidizer at 320°C. Friction and wear properties of these polished films were measured at elevated temperatures and in the presence of various gaseous environments. The coefficient of friction of the polished diamond films was found to be about 0.09, which is very close to that of natural diamond (0.07). The wear rate of the mating alumina ball slid against a polished diamond film was also found to be comparable, when slid natural diamond.

This content is only available via PDF.
You do not currently have access to this content.