The plasma printing was developed as a means to fabricate the micro-nozzle chip with the inner diameter less than 50 micro-meter. The initial two dimensional micro-pattern was printed onto the stainless steel substrate surface by the maskless lithography. These printed micro-patterns were utilized as a mask to make selective nitriding into the unprinted surface. After removal of printed pattern, the unnitrided surfaces were chemically etched to leave the nitrided micro-texture as a micro-nozzle chip. High nitrogen super-saturation as well as selective nitrogen diffusion had influence on the spatial resolution in this plasma printing in addition to the digital error in the maskless lithography.

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