The plasma printing was developed as a means to fabricate the micronozzle chip with the inner diameter less than 50 μm. The initial two-dimensional micropattern was printed onto the stainless steel substrate surface by the maskless lithography. These printed micropatterns were utilized as a mask to make selective nitriding into the unprinted surface. After removal of printed pattern, the un-nitrided surfaces were chemically etched to leave the nitrided microtexture as a micronozzle chip. High nitrogen supersaturation as well as selective nitrogen diffusion had influence on the spatial resolution in this plasma printing in addition to the digitizing error in the maskless lithography.