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The Editor and Editorial Board of the Journal of Manufacturing Science and Engineering would like to thank all of the reviewers for volunteering their expertise and time reviewing manuscripts in 2023. Serving as reviewers for the journal is a critical service necessary to maintain the quality of our publication and to provide the authors with a valuable peer review of their work. Below is a complete list of reviewers for 2023. We would also like to acknowledge four outstanding Reviewers of the Year.

2023 Reviewers of the Year

Kyle S. Saleeby — Georgia Tech, USA

Christopher Tyler — Oak Ridge National Laboratory, USA

Mark Jackson — Kansas State University Salina, USA

Mehdi Cherif — Arts et Métiers Paris Tech, France

The Reviewers of the Year Award is given to reviewers who have made an outstanding contribution to the journal in terms of the quantity, quality, and turnaround time of reviews completed during the past 12 months. The prize includes a Wall Plaque, 50 free downloads from the ASME Digital Collection, and a one year free subscription to the journal.

List of MANU Reviewers

  • M. Abdel-Hady Gepreel

  • A. Agarwal

  • K. Ahmadi

  • A. Ali

  • H. Arai

  • Y. Arai

  • B. Azeredo

  • M. Baral

  • S. Behdad

  • B. Bergmann

  • B. Bhushan

  • K. Breder

  • N. Bugdayci

  • V. Butte

  • K. Candioto

  • H. Cao

  • S. Castagne

  • S. Celen

  • H. Chanal

  • Y. Chen

  • G. Cheng

  • M. Cherif

  • D. Cherukuri

  • H. Chun

  • H. Chung

  • A. Cornelius

  • M. Cotterel

  • V. Cunha Lins

  • V. Dambly

  • F. Daniel

  • K. Desai

  • J. Dong

  • X. Dong

  • Y. Feng

  • Z. Feng

  • T. Furushima

  • P. Groche

  • P. Guo

  • W. Guo

  • X. Guo

  • Y. Guo

  • K. Haapala

  • M. Habibi

  • A. Haghighi

  • M. Hahn

  • S. Harst

  • T. Hayasaka

  • L. Heinrich

  • K. Helm

  • A. Henderson

  • D. Hoelzle

  • F. Imani

  • M. Jackson

  • M. Jahan

  • X. Jin

  • X. Jin

  • Y. JIXIANG

  • M. Jun

  • J. Karandikar

  • Z. Kilic

  • B. Kim

  • J. Kim

  • B. Kinsey

  • B. Kirsch

  • A. Klink

  • L. Kulinsky

  • V. Kumar

  • Z. Lai

  • M. Law

  • A. Layton

  • I. Lazoglu

  • V. Le

  • C. Lee

  • K. Lee

  • Y. Lee

  • J. Li

  • L. Li

  • M. Li

  • W. Li

  • X. Li

  • Y. Li

  • G. Liu

  • S. Liu

  • X. Liu

  • Z. Liu

  • M. Luo

  • C. Ma

  • J. Ma

  • S. Maeng

  • T. Maeno

  • A. Malik

  • P. Mallick

  • J. Mann

  • N. Maroju

  • R. Mathews

  • G. Mazars

  • A. Mehmeti

  • M. Merklein

  • J. Miers

  • S. Miller

  • E. Mirkoohi

  • M. Motlag

  • V. Nemani

  • G. Ngaile

  • C. Nikhare

  • F. Ning

  • J. Noder

  • V. Orlyanchik

  • K. Osswald

  • F. Ozturk

  • B. Pan

  • C. Pannier

  • S. Park

  • T. Paul

  • R. Pavel

  • N. Perry

  • A. Perveen

  • A. Piccininni

  • J. Pramudita

  • S. Prinz

  • V. Psyk

  • G. Rajshekhar

  • D. Ramanujan

  • B. Roy

  • C. Ruiz

  • K. Saleeby

  • K. Saxena

  • J. Schoop

  • E. Seidi

  • B. Sencer

  • R. Sharma

  • B. Shen

  • M. Sinha

  • C. Song

  • Q. Song

  • H. Sun

  • M. Sundaram

  • A. Tahan

  • B. Tai

  • S. Tajima

  • C. Tan

  • W. Tan

  • K. Tang

  • N. Tapoglou

  • S. Tawfick

  • A. Tiwari

  • T. Tucker

  • T. Tunc

  • O. Tuysuz

  • C. Tyler

  • V. Wagner

  • M. Wan

  • S. Wan

  • P. Wang

  • R. Wang

  • Y. Wang

  • Z. Wang

  • M. Werner

  • C. Wu

  • J. Xu

  • Z. Xu

  • T. Xue

  • J. Yan

  • P. Yan

  • E. Yen

  • B. Zhang

  • J. Zhang

  • M. Zhang

  • X. Zhao

  • S. Zheng

  • C. Zhou

  • D. Zhu