In Part II of these two-part papers, the effects of four finite element method (FEM) representations of the milling process on the prediction of chip morphology and residual stresses (RS) are investigated. Part II focuses on the milling of conventional uncut chip thickness h with finite cutting edge radius and flank wear, while Part I of these two-part papers has reported on the results in the case of milling small uncut chip thickness in the micrometer range with finite cutting edge radius. Two geometric models of the flank wear land composed of flat and curved wear land are proposed and assessed. The four process representations are (i) orthogonal cutting with flat wear land and with the mean uncut chip thickness ; (ii) orthogonal cutting with flat wear land and with variable h, which characterizes the down-milling process and which is imposed on a flat surface of the final workpiece; (iii) modeling the true kinematics of the down-milling process with flat wear land, and (iv) modeling the true kinematics of the down-milling process with curved wear land. They are designated as Cte-h, Var-h, True-h, and True-h*. The effectiveness of these representations is assessed when milling Ti6Al4V with a flank wear land of VB = 200 μm.