Silicon films of submicrometer thickness play a central role in many advanced technologies for computation and energy conversion. Numerous thermal conductivity data for silicon films are available in the literature, but they are mainly for the lateral, or in-plane, direction for both polycrystalline and single crystalline films. Here, we use time-domain thermoreflectance (TDTR), transmission electron microscopy, and semiclassical phonon transport theory to investigate thermal conduction normal to polycrystalline silicon (polysilicon) films of thickness 79, 176, and 630 nm on a diamond substrate. The data agree with theoretical predictions accounting for the coupled effects of phonon scattering on film boundaries and defects related to grain boundaries. Using the data and the phonon transport model, we extract the normal, or cross-plane thermal conductivity of the polysilicon (11.3 ± 3.5, 14.2 ± 3.5, and 25.6 ± 5.8 W m−1 K−1 for the 79, 176, and 630 nm films, respectively), as well as the thermal boundary resistance between polysilicon and diamond (6.5–8 m2 K GW−1) at room temperature. The nonuniformity in the extracted thermal conductivities is due to spatially varying distributions of imperfections in the direction normal to the film associated with nucleation and coalescence of grains and their subsequent columnar growth.
Cross-Plane Phonon Conduction in Polycrystalline Silicon Films
Contributed by the Heat Transfer Division of ASME for publication in the JOURNAL OF HEAT TRANSFER. Manuscript received September 10, 2014; final manuscript received February 5, 2015; published online March 24, 2015. Assoc. Editor: Zhuomin Zhang.
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Cho, J., Francis, D., Chao, P. C., Asheghi, M., and Goodson, K. E. (July 1, 2015). "Cross-Plane Phonon Conduction in Polycrystalline Silicon Films." ASME. J. Heat Transfer. July 2015; 137(7): 071303. https://doi.org/10.1115/1.4029820
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