The ablation of crystalline silicon by ultrashort laser pulses is studied experimentally. A pump-and-probe experiment is implemented in a collinear arrangement, utilizing a time-delayed frequency-doubled probe beam for in situ reflectance measurement and ultrafast microscopy observation. Enhanced surface reflectivity in sub-picosecond time scale at the center of the irradiated spot indicates nonthermal liquid layer formation. A short-lived nonthermal liquid phase was detected at fluence of In addition to this observation, the reflected images for pump beam fluences ranging from 1.5 to provide evidence of plasma expansion above the irradiated target.
Observation of Femtosecond Laser-Induced Ablation in Crystalline Silicon
Contributed by the Heat Transfer Division for publication in the JOURNAL OF HEAT TRANSFER. Manuscript received by the Heat Transfer Division April 22, 2003; revision received February 27, 2004. Associate Editor: G. Chen.
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Choi, T. Y., and Grigoropoulos, C. P. (November 16, 2004). "Observation of Femtosecond Laser-Induced Ablation in Crystalline Silicon ." ASME. J. Heat Transfer. October 2004; 126(5): 723–726. https://doi.org/10.1115/1.1795224
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