Carrier gas flow in a rapid thermal chemical vapor deposition (RTCVD) reactor was studied using flow visualization and laser induced Rayleigh light scattering (RLS). The flow field consists of a downward axisymmetric jet of carrier gas impinging on a wafer which undergoes transient heating. Flow visualization results showed three stable flow regimes as the surface rose from ambient to high temperature: momentum dominated, buoyancy dominated, and a second momentum dominated regime at high temperature; each separated by unstable, chaotic flows. RLS temperature measurements provided transient gas temperature histories, documenting flow visualization results. Regions of momentum dominated, buoyancy dominated, and unstable flows were defined as a function of Grashof number, Reynolds number, pressure, and wafer temperature.
Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor
Contributed by the Heat Transfer Division for publication in the JOURNAL OF HEAT TRANSFER. Manuscript received by the Heat Transfer Division March 28, 2001; revision received November 19, 2001. Associate Editor: C. Amon.
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Mathews , A. G., and Peterson, J. E. (May 10, 2002). "Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor ." ASME. J. Heat Transfer. June 2002; 124(3): 564–570. https://doi.org/10.1115/1.1469525
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