We examined the effect of the design parameters of a through-silicon via (TSV) on the thermomechanical stress distribution at the bottom of the TSV using finite element analysis. Static analyses were carried out at 350 °C to simulate the maximum thermomechanical stress during postplating annealing. The thermomechanical stress is concentrated in the lower region of a TSV, and the maximum stress in silicon occurs at the bottom of the TSV. The TSV diameter and dielectric liner thickness were two important determinants of the maximum stress in the silicon. The maximum stress decreased with decreasing TSV diameter, whereas the effect of aspect ratio was negligible. A thick dielectric liner is advantageous for lowering the maximum stress in silicon. The minimum dielectric thickness resulting in a maximum stress less than the yield stress of silicon was 520, 230, and 110 nm for via diameters of 20, 10, and 5 μm, respectively. The maximum stress also decreased with the thickness of the copper overburden.

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