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ASTM Selected Technical Papers
Semiconductor Fabrication: Technology and Metrology
By
DC Gupta
DC Gupta
1
Editor
.
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ISBN-10:
0-8031-1273-4
ISBN:
978-0-8031-1273-5
No. of Pages:
485
Publisher:
ASTM International
Publication date:
1989

There is a recognized need for standard artifacts with which to calibrate the laser-scanning instruments which detect and monitor microcontamination on semiconductor wafers. Although commercial calibration wafers are available for this purpose, the present paper proposes the use of National Bureau of Standards (NBS) particle-sizing standard microspheres, deposited on polished silicon substrates, as an alternative working standard until such time as a true national calibration artifact is developed. To this end, several techniques for depositing the microspheres on semiconductor surfaces are presented in the paper. In addition, the techniques used to certify the NBS particle standards and the measurement results from each technique are summarized.

1.
Fisher
,
W.G.
, “
Particle Monitoring in Clean Room Air with the TS 3020 Condensation Nucleus Counter
,”
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2.
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,”
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and
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,”
Microcontamination
,
07
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,
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, and
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,”
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5.
Mulholland
,
G. W.
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,
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,
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,
G. G.
,
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,
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, and
Lettieri
,
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, “
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,”
Journal of Research of the National Bureau of Standards
 0160-1741, Vol.
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, No.
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6.
Khilnani
,
A.
and
Matsuhiro
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, “
Adhesion Forces in Particle Removal from Wafer Surfaces
,”
Microcontamination
,
04
1986
, pp. 28-30.
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