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ASTM Selected Technical Papers
Laser Induced Damage in Optical Materials: 1985
By
HE Bennett
HE Bennett
1
Naval Weapons Center
?
China Lake, California 93555
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AH Guenther
AH Guenther
2
Air Force Weapons Laboratory
?
Kirtland Air Force Base, New Mexico 87117
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D Milam
D Milam
3
Lawrence Livermore National Laboratory
?
Livermore, California 94550
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BE Newnam
BE Newnam
4
Los Alamos National Laboratory
?
Los Alamos, New Mexico 87545
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ISBN-10:
0-8031-4479-2
ISBN:
978-0-8031-4479-8
No. of Pages:
582
Publisher:
ASTM International
Publication date:
1988

The experiments in this study were focused on the N-on-1 laser damage and sub-damage threshold ion emission of gallium arsenide. The initial goals were (1) to determine the N dependent damage threshold due to N-on-1 laser irradiance and (2) to correlate ion emission with surface damage events. A Q-switched Nd:YAG laser (1.064 μm, 45 nsec pulse, 580 μm spot diameter) was used to irradiate the ⟨100⟩ single crystal gallium arsenide samples.

Using values of N from 1 to 100, we obtained accumulation curves based on 50% damage probability. Corresponding damage threshold fluences were 0.4 – 0.8 J/cm2 for N>1 and approximately 1.5 J/cm2 for N=1. We observed large site-to-site fluctuations in ion emission, and emission occurred before surface damage was initiated. We found the onset of ion emission at a fluence of 0.2 J/cm2 for all cases, whereas the damage threshold fluence was two to five times larger and dependent on N. Experimental measurements of linear and nonlinear absorption coefficients were made to check for anomalous absorption. The measured values were in agreement with those previously reported. Once surface damage occurred, ion emission was greatly increased. This type of behavior seems to support a surface cleaning model for ion emission which precedes surface damage.

1.
Becker
M. F.
,
Jhee
Y. K.
,
Bordelon
M.
, and
Walser
R. M.
, “
Charged Particle Exoemission from Silicon during Multi-Pulse Laser Induced Damage
,” 14th ASTM Laser Damage Symposium, NBS Special Publication #669,
Boulder, CO
,
1983
; and
Jhee
Y. K.
,
Becker
M. F.
, and
Walser
R. M.
, “
Charge Emission and Precursor Accumulation in the Multi-pulse Damage Regime of Silicon
,”
Journal of the Optical Society of America
 0030-3941 
B 2
,
10
1985
, pp. 1626–1633.
2.
Dannefaer
S.
,
Hogg
B.
, and
Kerr
D.
, “
Defect Characterization in Gallium Arsenide by Positron Annihilation
,” Thirteenth International Conference on Defects in Semiconductors, Eds.
Kimerling
L. C.
and
Parsey
,
J. M.
 Jr.
, pp. 1029–1033.
3.
Lee
C. S.
,
Koumvakalis
N.
, and
Bass
M.
, “
A Theoretical Model for Multiple-pulse Laser-induced Damage to Metal Mirrors
,”
Journal of Applied Physics
 0021-8979 
54
(
10
),
10
1983
, pp. 5727–5731.
4.
Manenkov
A. A.
,
Matyushin
G. A.
,
Nechitailo
V. S.
,
Prokhorov
A. M.
, and
Tsaprilov
A. S.
, “
On the Nature of Accumulation Effect in the Laser-Induced Damage to Optical Materials
,” 14th ASTM Laser Damage Symposium, NBS Special Publication #669,
Boulder, CO
,
1983
, pp. 436–447.
5.
Fauchet
P. M.
and
Siegman
A. E.
, “
Surface Ripples on Silicon and Gallium Arsenide under Picosecond Laser Illumination
,”
Applied Physics Letters
 0003-6951 
40
(
9
),
01
05
1982
, pp. 824–826.
6.
Van Stryland
E. W.
,
Vanherzeele
H.
,
Woodall
M. A.
,
Soileau
M. J.
,
Smirl
A. L.
,
Guha
S.
, and
Boggess
T. E.
, “
Two Photon Absorption, Nonlinear Refraction, and Optical Limiting in Semiconductors
,”
Optical Engineering
 0091-3286 
24
(
4
), July/August 1985, pp. 613–623.
7.
Bechtel
J. H.
and
Smith
W. L.
, “
Two-Photon Absorption in Semiconductors with Picosecond Laser Pulses
,”
Physical Review B
 0556-2805 
13
(
8
),
15
04
1976
, PP. 3515–3522.
8.
Lee
C. C.
and
Fan
H. Y.
, “
Second-Harmonic Generation in InSb, InP, and AlSb
,”
Physical Review B
 0556-2805 
10
(
2
),
15
07
1974
, pp. 703–709.
9.
Merkle
K. L.
,
Uebbing
R. H.
,
Baumgart
H.
, and
Phillipp
F.
, “
Picosecond Laser Pulse Induced Damage in Crystalline Silicon
,” Laser and Electron-Beam Interactions with Solids, Eds.
Appleton
B. R.
and
Celler
G. K.
,
1982
, pp. 337–342.
10.
van Vechten
J. A.
and
Compaan
A. D.
, “
Plasma Annealing of Semiconductors; Plasmon Condensation to a Superconductivity Like State at 1000 K?
Solid State Communication
39
(
2
), (
8
),
08
1981
, pp. 867–873.
11.
Kim
D. M.
,
Shah
R. R.
,
Von der Linde
D.
, and
Crosthwait
D. L.
, “
Picosecond Dynamics of Laser Annealing
,” Laser and Electron-Beam Interactions with Solids, Eds.
Appleton
B. R.
and
Celler
G. K.
,
1982
, pp. 85–90.
12.
Mathur
V. K.
and
Rogers
S.
, “
Relaxation of Photoexcited Carriers in GaAs
,”
Applied Physics Letters
 0003-6951 
31
(
11
),
01
12
1977
, pp. 765–768.
13.
Willardson
R. K.
and
Beer
A. C.
,
Semiconductors and Semimetals
: Optical Properties of III–V Compounds
3
,
New York
:
Academic Press
,
1967
, p. 409.
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