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ASTM Selected Technical Papers
Emerging Semiconductor Technology
By
DC Gupta
DC Gupta
Symposium Chairman and Co-Editor
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ISBN-10:
0-8031-0459-6
ISBN:
978-0-8031-0459-4
No. of Pages:
719
Publisher:
ASTM International
Publication date:
1987
eBook Chapter
Particulate Control in VLSI Gases
By
JM Davidson
,
JM Davidson
1Drs. Davidson and Ruane are
Senior Scientist and Senior Physicist
, respectively, at The BOC Group, Inc., Group Technical Center
, 100 Mountain Avenue, Murray Hill, NJ 07974
.
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TP Ruane
TP Ruane
1Drs. Davidson and Ruane are
Senior Scientist and Senior Physicist
, respectively, at The BOC Group, Inc., Group Technical Center
, 100 Mountain Avenue, Murray Hill, NJ 07974
.
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Page Count:
15
-
Published:1987
Citation
Davidson, J, & Ruane, T. "Particulate Control in VLSI Gases." Emerging Semiconductor Technology. Ed. Gupta, D. 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959 : ASTM International, 1987.
Download citation file:
Semiconductor device miniaturization has required continually decreasing levels of particulate contamination in process gases. This paper briefly reviews existing technologies for analyzing and for minimizing particles in VLSI gas streams. Recent advances and research topics in both areas are also addressed. Examples from laboratory and field evaluations of VLSI and non-VLSI systems are discussed.
References
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,” Journal of the Electrochemical Society
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, No. 9
, 09
1985
, pp. 2208-2214.
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