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ASTM Selected Technical Papers
Emerging Semiconductor Technology
By
DC Gupta
DC Gupta
Symposium Chairman and Co-Editor
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ISBN-10:
0-8031-0459-6
ISBN:
978-0-8031-0459-4
No. of Pages:
719
Publisher:
ASTM International
Publication date:
1987
eBook Chapter
Quality Control and Optimization During Plasma Deposition of a-Si:H
By
M Kunst
,
M Kunst
1Drs. Kunst, Werner, Beck, Kuppers, and Lilie are
research scientists, Professor
Tributsch is member of the chairmen board of the Bereich Strahlenchemie
, Hahn-Meitner-Institut fur Kernforschung Berlin
, 1000 Berlin 39,
.Federal Republic of Germany
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A Werner
,
A Werner
1Drs. Kunst, Werner, Beck, Kuppers, and Lilie are
research scientists, Professor
Tributsch is member of the chairmen board of the Bereich Strahlenchemie
, Hahn-Meitner-Institut fur Kernforschung Berlin
, 1000 Berlin 39,
.Federal Republic of Germany
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G Beck
,
G Beck
1Drs. Kunst, Werner, Beck, Kuppers, and Lilie are
research scientists, Professor
Tributsch is member of the chairmen board of the Bereich Strahlenchemie
, Hahn-Meitner-Institut fur Kernforschung Berlin
, 1000 Berlin 39,
.Federal Republic of Germany
Search for other works by this author on:
U Kuppers
,
U Kuppers
1Drs. Kunst, Werner, Beck, Kuppers, and Lilie are
research scientists, Professor
Tributsch is member of the chairmen board of the Bereich Strahlenchemie
, Hahn-Meitner-Institut fur Kernforschung Berlin
, 1000 Berlin 39,
.Federal Republic of Germany
Search for other works by this author on:
H Tributsch
H Tributsch
1Drs. Kunst, Werner, Beck, Kuppers, and Lilie are
research scientists, Professor
Tributsch is member of the chairmen board of the Bereich Strahlenchemie
, Hahn-Meitner-Institut fur Kernforschung Berlin
, 1000 Berlin 39,
.Federal Republic of Germany
Search for other works by this author on:
Page Count:
9
-
Published:1987
Citation
Kunst, M, Werner, A, Beck, G, Kuppers, U, & Tributsch, H. "Quality Control and Optimization During Plasma Deposition of a-Si:H." Emerging Semiconductor Technology. Ed. Gupta, D. 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959 : ASTM International, 1987.
Download citation file:
It is shown that contactless time-resolved microwave conductivity (TRMC) measurements permit an in-process quality control during the plasma deposition of amorphous hydrogenated silicon (a-Si:H) films. The relation between the transient photoconductivity of the amorphous semiconductor and its quality is discussed. The influence of various parameters, such as the substrate temperature and chemical composition on the shape of the signals is explained in terms of charge carrier kinetics. An automated production process to yield quality films is presented to demonstrate the use of these measurements.
References
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Kuppers
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, accepted for publication in IEEE Trans. on Industrial Electronics
.10.
Publication in preparation.
11.
Tributsch
, H.
, Beck
, G.
, Kunst
, M.
, Kuppers
, U.
, Lewerenz
, H. J.
, Lilie
, J.
, and Werner
, A.
, U.S. Patent Application, Ser. no. 694932, 1985
.
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