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ASTM Selected Technical Papers
Laser Induced Damage In Optical Materials: 1983
By
HE Bennett,
HE Bennett
1
Naval Weapons Center
?China Lake, California 93555
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AH Guenther,
AH Guenther
2
Air Force Weapons Laboratory Kirtland Air Force Base
, New Mexico 87117
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D Milam,
D Milam
3
Lawrence Livermore National Laboratory
?Livermore, California 94550
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BE Newnam
BE Newnam
4
Los Alamos National Laboratory
?Los Alamos, New Mexico 87545
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ISBN-10:
0-8031-0930-X
ISBN:
978-0-8031-0930-8
No. of Pages:
584
Publisher:
ASTM International
Publication date:
1985
eBook Chapter
A Wide Spectrum Antireflective Coating for Silica Optics and its Damage Resistance at 350 nm
By
BE Yoldas
,
BE Yoldas
1
Westinghouse Research and Development Center
Pittsburgh, Pennsylvania 15235
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DP Partlow
,
DP Partlow
1
Westinghouse Research and Development Center
Pittsburgh, Pennsylvania 15235
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HD Smith
HD Smith
2
Westinghouse Hanford
Richland, Washington 99352
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Page Count:
10
-
Published:1985
Citation
Yoldas, B, Partlow, D, & Smith, H. "A Wide Spectrum Antireflective Coating for Silica Optics and its Damage Resistance at 350 nm." Laser Induced Damage In Optical Materials: 1983. Ed. Bennett, H, Guenther, A, Milam, D, & Newnam, B. 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959 : ASTM International, 1985.
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A wide-spectrum antireflective coating has been developed for fused-silica optics. This coating provides antireflectivity down to ∼300 nm on fused silica, increasing its transmission to better than 99%. The coating is a single-layer graded-index film applied from special polymer-oxide solutions. The graded index results from nonscattering porosity and tailoring of the pore morphology. Unlike state-of-the-art techniques, however, the method does not involve phase-separated glasses, not does it require etching for the creation of porosity. The damage thresholds of coated fused silica optics at 350 nm initially varied from less than 1 J/cm2 to 9 J/cm2. The main causes of this large variation in the damage threshold were investigated and determined to be substrate polishing, substrate surface cleaning, and coating solution chemistry and processing which, under certain conditions, leads to carbon formation during the heat treatment of the coating.
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