Due to the direct contact between the stamp and polymer film during the nanoimprint lithography (NIL) process, the adhesion and friction are unavoidable. To investigate the effect of adhesion and friction on the pattern transfer, molecular dynamics (MD) simulation of NIL is performed. As the simulation results, the adhesion and friction forces between the stamp and polymer film are calculated and the effects of the adhesion and friction on the pattern transfer are studied.
Volume Subject Area:
Micro- and Nanotribology
This content is only available via PDF.
Copyright © 2005
by ASME
You do not currently have access to this content.