Silica sol nano-abrasives with large particle are prepared and characterized by TEM, PCS and Zeta potential in this paper. Results show that the silica sol nano-abrasives about 100nm are of higher stability (Zeta potential: −65mV) and narrow distribution of particle size. And then alkali CMP slurries for tungsten containing self-made silica sol nano-abrasives are prepared and applied. CMP results show that the removal rate has been improved to 367nm/min and the RMS of surface roughness has been reduced from 4.4nm to 0.80nm. In sum, one kind of alkali slurry containing 100nm silica sol for tungsten CMP is studied.
Chemical Mechanical Polishing Slurry for Tungsten in ULSI With Large Particle Size Colloidal Silica Nano-Abrasive
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Zhang, K, Song, Z, & Feng, S. "Chemical Mechanical Polishing Slurry for Tungsten in ULSI With Large Particle Size Colloidal Silica Nano-Abrasive." Proceedings of the World Tribology Congress III. World Tribology Congress III, Volume 2. Washington, D.C., USA. September 12–16, 2005. pp. 515-516. ASME. https://doi.org/10.1115/WTC2005-64249
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