Tungsten disulphide (WS2) and molybdenum disulfide (MoS2), which belong to the family of transition metal dichalcogenides, are well known for their solid lubricating behavior. Thin films of MoS2 and WS2 exhibit extremely low coefficient of friction (COF ∼0.02 to 0.05) in dry environments, and are typically applied by sputter deposition, pulsed laser ablation, evaporation or chemical vapor deposition, which are essentially either line-of-sight or high temperature processes. With these techniques it is difficult to coat surfaces shadowed from the target, or uniformly coat sidewalls of three-dimensional or high aspect ratio structures. For applications such as micromechanical (MEMS) devices, where dimensions and separation tolerances are small, and aspect ratios are large, these traditional deposition techniques are inadequate. Atomic layer deposition (ALD) is a chemical vapor deposition technique that could overcome many of these problems by using sequential introduction of gaseous precursors and selective surface chemistry to achieve controlled growth at lower temperatures, but the chemistry needed to grow transition metal dichalcogenide films by ALD is not known.
Skip Nav Destination
Sign In or Register for Account
World Tribology Congress III
September 12–16, 2005
Washington, D.C., USA
Conference Sponsors:
- Tribology Division
ISBN:
0-7918-4202-9
PROCEEDINGS PAPER
Atomic Layer Deposition of Solid Lubricant Thin Films
T. W. Scharf
,
T. W. Scharf
Sandia National Laboratories, Albuquerque, NM
Search for other works by this author on:
S. V. Prasad
,
S. V. Prasad
Sandia National Laboratories, Albuquerque, NM
Search for other works by this author on:
M. T. Dugger
,
M. T. Dugger
Sandia National Laboratories, Albuquerque, NM
Search for other works by this author on:
T. M. Mayer
T. M. Mayer
Sandia National Laboratories, Albuquerque, NM
Search for other works by this author on:
T. W. Scharf
Sandia National Laboratories, Albuquerque, NM
S. V. Prasad
Sandia National Laboratories, Albuquerque, NM
M. T. Dugger
Sandia National Laboratories, Albuquerque, NM
T. M. Mayer
Sandia National Laboratories, Albuquerque, NM
Paper No:
WTC2005-63566, pp. 375-376; 2 pages
Published Online:
November 17, 2008
Citation
Scharf, TW, Prasad, SV, Dugger, MT, & Mayer, TM. "Atomic Layer Deposition of Solid Lubricant Thin Films." Proceedings of the World Tribology Congress III. World Tribology Congress III, Volume 2. Washington, D.C., USA. September 12–16, 2005. pp. 375-376. ASME. https://doi.org/10.1115/WTC2005-63566
Download citation file:
Sign In
4
Views
0
Citations
Related Proceedings Papers
Related Articles
Related Chapters
Surface Analysis and Tools
Tribology of Mechanical Systems: A Guide to Present and Future Technologies
Modeling Transition Metal Nanoclusters for Hydrogen Storage Capacity Using Artificial Neural Networks
Intelligent Engineering Systems Through Artificial Neural Networks, Volume 17
Multi-Field Modeling of Hydrogen Transport and Fracture in Group 4 Transition Metals
International Hydrogen Conference (IHC 2012): Hydrogen-Materials Interactions