Silicon-based ceramics such as silicon nitride can be very effectively lubricated by water under certain conditions (1–3). After a wear-in period a condition of very low friction coefficient (<0.01) can be achieved for average contact pressures of 40 MPa and lower. Tomizawa & Fischer (1) proposed a chemomechanical polishing mechanism to reduce surface roughness enabling the onset of hydrodynamic lubrication by water. We suggest that there is an additional soft hydrated silica gel layer adhering to the rubbing surfaces that provides a deformable protective film to enable effective hydrodynamic lubrication of water and protect the surfaces from occasional asperity contacts. The existence of such films was indicated by the nanomechanical data performed on worn surfaces.
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World Tribology Congress III
September 12–16, 2005
Washington, D.C., USA
Conference Sponsors:
- Tribology Division
ISBN:
0-7918-4201-0
PROCEEDINGS PAPER
Tribochemical Reactions at the Water-Lubricated Silicon Nitride Interface: Gel Formation Mechanism
Richard S. Gates,
Richard S. Gates
National Institute of Standards and Technology, Gaithersburg, MD
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Z. Charles Ying,
Z. Charles Ying
National Institute of Standards and Technology, Gaithersburg, MD
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Stephen M. Hsu
Stephen M. Hsu
National Institute of Standards and Technology, Gaithersburg, MD
Search for other works by this author on:
Richard S. Gates
National Institute of Standards and Technology, Gaithersburg, MD
Z. Charles Ying
National Institute of Standards and Technology, Gaithersburg, MD
Stephen M. Hsu
National Institute of Standards and Technology, Gaithersburg, MD
Paper No:
WTC2005-64310, pp. 675-676; 2 pages
Published Online:
November 17, 2008
Citation
Gates, RS, Ying, ZC, & Hsu, SM. "Tribochemical Reactions at the Water-Lubricated Silicon Nitride Interface: Gel Formation Mechanism." Proceedings of the World Tribology Congress III. World Tribology Congress III, Volume 1. Washington, D.C., USA. September 12–16, 2005. pp. 675-676. ASME. https://doi.org/10.1115/WTC2005-64310
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