Many upcoming applications, such as nanoelectronic circuitry, single-molecule based chips, nanofluidics, chemical sensors, and fuel cells, require large arrays of nanochannels and nanowires. To commercialize such nanostructured devices, a high resolution and high throughput patterning method is essential. For this purpose, we developed the shadow edge lithography (SEL) as a wafer-scale, high-throughput nanomanufacturing method . In the proposed method, the shadow effect in the high-vacuum evaporation was theoretically analyzed to predict the geometric distribution of the nanoscale patterns . In experiment, nanoscale patterns were created by the shadow of aluminum (Al) edges that were prepatterned using a conventional microfabrication method.
- ASME Nanotechnology Council
Shadow Edge Lithography and Application to Nanofluidics
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Yeo, W, Lee, DW, Lee, K, & Chung, J. "Shadow Edge Lithography and Application to Nanofluidics." Proceedings of the ASME 2010 First Global Congress on NanoEngineering for Medicine and Biology. ASME 2010 First Global Congress on NanoEngineering for Medicine and Biology. Houston, Texas, USA. February 7–10, 2010. pp. 63-64. ASME. https://doi.org/10.1115/NEMB2010-13307
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