Surface-Plasmons-Assisted Nanoscale Photolithography

Photolithography has remained a useful micro-fabrication technology because of its high throughput, low cost, simplicity, and reproducibility over the past several decades. However its resolution is limited at a sub-wavelength scale due to optical diffraction. Among all different approaches to overcoming this problem, such as electron-beam lithography, imprint lithography and scanning probe lithography, near-field optical lithography inherits many merits of the traditional photolithography method. Major drawbacks of this approach include low contrast, low transmission and low density.