A near-field optical technique, using a new type of solid immersion lens (SIL), has been developed and applied to various areas, for example, high-density optical storage, near-field-scanning-optical-microscope probes, photolithography. Solid immersion microscopy offers a method for achieving resolution below the diffraction limit in air with significantly higher optical throughput by focusing light through a high refractive-index SIL held close to a sample [1]. The minimum resolution of a focusing system is inversely proportional to numerical aperture (NA), where NA = n sinθ, θ is the maximum angle of incidence, and n is the index of refraction at the focal point. Light with vacuum wavelength λ can be focused by an aberration-free lens to a spot whose full width at half maximum (FWHM) is λ/(2 NA) in the scalar diffraction limit, equivalent to Sparrow’s criterion for spatial resolution. In a medium of refractive index n, the effective wavelength is λeff = λ/n and corresponding effective numerical aperture is NAeff = n2sinθ. When a SIL is used, improvements in NAeff and spatial resolution are proportional to the refractive index of the SIL material. Fletcher et al. demonstrated imaging in the infrared with a microfabricated SIL [1, 2]. Baba et al. analyzed the aberrations and allowances for an aspheric error, a thickness error, and an air gap when using a hemispherical SIL for photoluminescence microscopy with submicron resolution beyond the diffraction limit [3]. Terris et al. developed and applied a SIL-based near-field optical technique for the writing and reading domains in a magneto-optic material [4]. Song et al. proposed the new concept of a SIL for high density optical recording using the near-field recording technology [5]. In this paper, we propose a sub-micron scale laser processing technique with spatial resolution beyond the diffraction limit in air using near-field optics. Our goal is to eventually develop a massively parallel nano-optical direct-write nano-manufacturing technique.
Skip Nav Destination
ASME 2004 3rd Integrated Nanosystems Conference
September 22–24, 2004
Pasadena, California, USA
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4177-4
PROCEEDINGS PAPER
Laser Nano-Machining Using Near-Field Optics
Haseung Chung,
Haseung Chung
University of Michigan, Ann Arbor, MI
Search for other works by this author on:
Katsuo Kurabayashi,
Katsuo Kurabayashi
University of Michigan, Ann Arbor, MI
Search for other works by this author on:
Suman Das
Suman Das
University of Michigan, Ann Arbor, MI
Search for other works by this author on:
Haseung Chung
University of Michigan, Ann Arbor, MI
Katsuo Kurabayashi
University of Michigan, Ann Arbor, MI
Suman Das
University of Michigan, Ann Arbor, MI
Paper No:
NANO2004-46056, pp. 115-116; 2 pages
Published Online:
November 17, 2008
Citation
Chung, H, Kurabayashi, K, & Das, S. "Laser Nano-Machining Using Near-Field Optics." Proceedings of the ASME 2004 3rd Integrated Nanosystems Conference. Design, Synthesis, and Applications. Pasadena, California, USA. September 22–24, 2004. pp. 115-116. ASME. https://doi.org/10.1115/NANO2004-46056
Download citation file:
7
Views
Related Proceedings Papers
Related Articles
Spectral Microscopy Imaging System for High-Resolution and High-Speed Imaging of Fuel Sprays
J. Eng. Gas Turbines Power (September,2020)
Fast Dispersive Laser Scanner by Using Digital Micro Mirror Arrays
J. Micro Nano-Manuf (June,2014)
The Depth of Correlation in Micro-PIV for High Numerical Aperture and Immersion Objectives
J. Fluids Eng (July,2006)
Related Chapters
The Marketing Research of DSC Viewfinder Technology
International Conference on Advanced Computer Theory and Engineering, 4th (ICACTE 2011)
A Chemical Precursor to Optical Damage? Studies by Laser Ionization Mass Spectrometry
Laser Induced Damage in Optical Materials: 1987
An Instrumentation System to Automate the Analysis of Fuel-Spray Images Using Computer Vision
Liquid Particle Size Measurement Techniques