This paper reports the creation of surface textures using Photochemical Machining Process (PCM) on Monel 400. Machining is carried out on Monel 400 sheets. The influence of the photolithography parameters and spinning speed on the photoresist films were investigated. The etching media used is HNO3:FeCl3:H2O = 30ml: 500g: per liter concentration. The effects of etching time and temperature on the etched topography pattern were studied. It has been observed that time has more influence on the depth of etch as compared to temperature. However temperature influence surface finish more.

Volume Subject Area:
Processing
Topics:
Machining, Etching, Temperature, Finishes, Photolithography, Photoresists, Spin (Aerodynamics), Spinning (Textile), Surface texture, Water
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