Nano-patterning of graphene film by a novel approach making use of laser ablation generated pressure is presented in this paper. Arrays of nanoscale holes were fabricated by applying laser shock pressure on graphene film suspending on well trenches in silicon substrate. Round holes with diameters ranging from 50 to 200 nm on graphene film were successfully punched. The critical pressure was found to be dependent on the diameter of holes. Smaller the diameters, higher critical pressure, which was also captured by the molecular dynamic (MD) simulations. The laser shock based approach presented in this paper provides an effective way to pattern graphene film with nanoscale features at an easy, fast and scalable manner.
- Manufacturing Engineering Division
Laser Shock Induced Nano-Patterning of Graphene
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Li, J, Cheng, GJ, Zhang, R, & Jiang, H. "Laser Shock Induced Nano-Patterning of Graphene." Proceedings of the ASME 2012 International Manufacturing Science and Engineering Conference collocated with the 40th North American Manufacturing Research Conference and in participation with the International Conference on Tribology Materials and Processing. ASME 2012 International Manufacturing Science and Engineering Conference. Notre Dame, Indiana, USA. June 4–8, 2012. pp. 545-551. ASME. https://doi.org/10.1115/MSEC2012-7378
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