Atomic layer deposition (ALD) is a key enabling nanotechnology for a broad array of applications due to its ability to grow conformal and pinhole-free thin films and control layer growth at atomic scale. Like many nanotechnologies, the potential amount of nano-particle emissions from ALD nano-manufacturing system is a significant concern for both occupational and public health exposure. Here we report our preliminary investigations of nano-particle emissions at end-of-the-pipe of ALD nano-manufacturing system. Scanning Mobility Particle Sizer (SMPS) spectrometer is used for the nano-particle measurement during the ALD process of Al2O3 high-k dielectric gate materials using Trimethyl Aluminum (TMA) and H2O binary reactions. Under various experimental conditions tested in our project, the results demonstrate that the aerosol nanoparticle emissions from ALD nano-manufacturing system are averaged with a mean diameter of 201.28 nm and 940,850 particle concentrations at 200 °C reaction temperature.
- Manufacturing Engineering Division
Experimental Measurement of Nano-Particle Emissions From Atomic Layer Deposition
- Views Icon Views
- Share Icon Share
- Search Site
Huo, J, Lin, X, & Yuan, C. "Experimental Measurement of Nano-Particle Emissions From Atomic Layer Deposition." Proceedings of the ASME 2012 International Manufacturing Science and Engineering Conference collocated with the 40th North American Manufacturing Research Conference and in participation with the International Conference on Tribology Materials and Processing. ASME 2012 International Manufacturing Science and Engineering Conference. Notre Dame, Indiana, USA. June 4–8, 2012. pp. 1105-1113. ASME. https://doi.org/10.1115/MSEC2012-7320
Download citation file: