Wide bandgap semiconductor technology is expected to have a dramatic impact on radar and communications systems. To take full advantage of the power capabilities and small device sizes of wide bandgap semiconductors, new and novel thermal management solutions, especially for high power density, monolithic microwave integrated circuits (MMICs) are in high demand. In this paper, a quantum-well Si/SiC self-cooling concept for hot spot thermal management at the multi-fingered GaN high electron mobility transistor (HEMTs) in the GaN-on-SiC package is proposed and investigated using a three dimensional (3-D) thermal-electric coupling simulation. The impact of electric current, cooler size, Si/SiC substrate thickness, Si/SiC thermal conductivity, and interfacial parasitic effect on the hot spot cooling is examined and discussed. The preliminary modeling results strongly suggest that self-cooling phenomenon inherent in the quantum-well Si/SiC substrate can be used to remove local high heat flux hot spot on the semiconductor devices.
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ASME 2012 Third International Conference on Micro/Nanoscale Heat and Mass Transfer
March 3–6, 2012
Atlanta, Georgia, USA
Conference Sponsors:
- Nanotechnology Institute
ISBN:
978-0-7918-5477-8
PROCEEDINGS PAPER
Quantum-Well Si/SiC Self-Cooling for Thermal Management of High Heat Flux GaN HEMT Semiconductor Devices
Peng Wang,
Peng Wang
University of Maryland at College Park, College Park, MD
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Michael Manno,
Michael Manno
University of Maryland at College Park, College Park, MD
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Avram Bar-Cohen
Avram Bar-Cohen
University of Maryland at College Park, College Park, MD
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Peng Wang
University of Maryland at College Park, College Park, MD
Michael Manno
University of Maryland at College Park, College Park, MD
Avram Bar-Cohen
University of Maryland at College Park, College Park, MD
Paper No:
MNHMT2012-75290, pp. 615-624; 10 pages
Published Online:
July 18, 2013
Citation
Wang, P, Manno, M, & Bar-Cohen, A. "Quantum-Well Si/SiC Self-Cooling for Thermal Management of High Heat Flux GaN HEMT Semiconductor Devices." Proceedings of the ASME 2012 Third International Conference on Micro/Nanoscale Heat and Mass Transfer. ASME 2012 Third International Conference on Micro/Nanoscale Heat and Mass Transfer. Atlanta, Georgia, USA. March 3–6, 2012. pp. 615-624. ASME. https://doi.org/10.1115/MNHMT2012-75290
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