Semiconductor thin films are pervasive in advanced technological devices. For example, the active region in a quantum cascade laser contains films of direct bandgap semiconductors with thicknesses of 1–10 nm [1]. Superlattices, periodic materials that contain films of alternating species with thicknesses as small as 1 nm, are being studied for their potential to increase the efficiency of thermoelectric energy conversion devices [2]. Because these film thicknesses are less than the mean free paths of the phonons in the corresponding bulk material, the thermal transport properties of semiconductor thin films are different than their corresponding bulk values [3]. To aid in the design of devices employing thin films, accurate models for the thermal transport properties of the film are required.
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ASME 2009 Second International Conference on Micro/Nanoscale Heat and Mass Transfer
December 18–21, 2009
Shanghai, China
Conference Sponsors:
- Nanotechnology Institute
ISBN:
978-0-7918-4390-1
PROCEEDINGS PAPER
Thermal Resistance of Semiconductor Thin Films Predicted From Lattice Dynamics Calculations and Molecular Dynamics Simulations
E. S. Landry,
E. S. Landry
Carnegie Mellon University, Pittsburgh, PA
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A. J. H. McGaughey
A. J. H. McGaughey
Carnegie Mellon University, Pittsburgh, PA
Search for other works by this author on:
E. S. Landry
Carnegie Mellon University, Pittsburgh, PA
A. J. H. McGaughey
Carnegie Mellon University, Pittsburgh, PA
Paper No:
MNHMT2009-18341, pp. 685-690; 6 pages
Published Online:
October 26, 2010
Citation
Landry, ES, & McGaughey, AJH. "Thermal Resistance of Semiconductor Thin Films Predicted From Lattice Dynamics Calculations and Molecular Dynamics Simulations." Proceedings of the ASME 2009 Second International Conference on Micro/Nanoscale Heat and Mass Transfer. ASME 2009 Second International Conference on Micro/Nanoscale Heat and Mass Transfer, Volume 2. Shanghai, China. December 18–21, 2009. pp. 685-690. ASME. https://doi.org/10.1115/MNHMT2009-18341
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