To overcome the difficulties in the fabrication of nanoscale linewidth standards with lithography, a method of fabricating nanoscale multiple linewidth standards based on multilayer thin film deposition technique is presented in this paper. This method can be implemented easily and does not require the use of complex and expensive techniques, and it has advantage of well-controlled linewidth over various millimetres (using thin film thickness control) and versatile materials selection of the grating lines. Nanoscale multiple linewidth samples with nominal linewidths of 20 nm, 25 nm, 35 nm have been fabricated with the presented method. The lines of the fabricated samples have uniform attributes and good linearity over hundreds microns.

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