A new surface nano-patterning technique, the so-called UTAM nano-patterning approach, is reported here in this paper. Using the UTAM nano-patterning technique, large-scale arrays of highly ordered nanostructures (nanoparticles and nanoholes) in the range of square centimeters have been fabricated on substrates in a massive parallel way. The resulting nanostructures are characterized by highly defined and controllable size, shape, composition, and spacing of the nanostructures. By changing the structural parameters of the nanoparticles, the properties of the nanoparticle arrays can be tuned. This non-lithographic surface nano-patterning approach provides an efficient and low-cost alternative in fabricating large-scale ordered arrays of surface nanostructures.
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2007 First International Conference on Integration and Commercialization of Micro and Nanosystems
January 10–13, 2007
Sanya, Hainan, China
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4265-7
PROCEEDINGS PAPER
The UTAM Nano-Patterning: A New Surface Nano-Patterning Technique in Fabricating Ordered Arrayed Surface Nanostructures
Yong Lei,
Yong Lei
University of Muenster, Muenster, Germany
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Gerhard Wilde
Gerhard Wilde
University of Muenster, Muenster, Germany
Search for other works by this author on:
Yong Lei
University of Muenster, Muenster, Germany
Gerhard Wilde
University of Muenster, Muenster, Germany
Paper No:
MNC2007-21628, pp. 1557-1560; 4 pages
Published Online:
June 8, 2009
Citation
Lei, Y, & Wilde, G. "The UTAM Nano-Patterning: A New Surface Nano-Patterning Technique in Fabricating Ordered Arrayed Surface Nanostructures." Proceedings of the 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems. First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B. Sanya, Hainan, China. January 10–13, 2007. pp. 1557-1560. ASME. https://doi.org/10.1115/MNC2007-21628
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