This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μm. It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.
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2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems
June 3–5, 2008
Clear Water Bay, Kowloon, Hong Kong
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4294-0
PROCEEDINGS PAPER
Fabrication of Phase Reflection Sawtooth Gratings Optimized by Scalar and Vector Way by Using Diamond Cutting Available to Purchase
ChaBum Lee,
ChaBum Lee
Gwang-Ju Institute of Science and Technology, Gwang-Ju, South Korea
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T. Kuriyagawa,
T. Kuriyagawa
Tohoku University, Sendai, Japan
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TaeJun Kim,
TaeJun Kim
Gwang-Ju Institute of Science and Technology, Gwang-Ju, South Korea
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SunKyu Lee
SunKyu Lee
Gwang-Ju Institute of Science and Technology, Gwang-Ju, South Korea
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ChaBum Lee
Gwang-Ju Institute of Science and Technology, Gwang-Ju, South Korea
T. Kuriyagawa
Tohoku University, Sendai, Japan
TaeJun Kim
Gwang-Ju Institute of Science and Technology, Gwang-Ju, South Korea
SunKyu Lee
Gwang-Ju Institute of Science and Technology, Gwang-Ju, South Korea
Paper No:
MicroNano2008-70266, pp. 703-704; 2 pages
Published Online:
June 12, 2009
Citation
Lee, C, Kuriyagawa, T, Kim, T, & Lee, S. "Fabrication of Phase Reflection Sawtooth Gratings Optimized by Scalar and Vector Way by Using Diamond Cutting." Proceedings of the 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. Clear Water Bay, Kowloon, Hong Kong. June 3–5, 2008. pp. 703-704. ASME. https://doi.org/10.1115/MicroNano2008-70266
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