A two-dimensional ultra-precision positioning system with high-speed and large-range which can be used for micro-nanometer machining has been studied out in this paper. Macro and micro moving system are used to meet the demands of ultra-precision positioning with high-speed and large-range. According to the demands of macro moving system, a valid control of fuzzy-neuron self-adaptive and weighted PID control algorithm with high speed and high precision is proposed. The experimental results show that the error of repeated positioning accuracy is less than 1 μ m for a random point within the range of 300mm by 300mm under the design load for a carrying test-bed with carrying area of 250mm by 250mm. According to the demands of micro moving system, self-adaptive and fuzzy reasoning PID control system based on neural network is studied for the first time. The experimental results show that repeated positioning accuracy is less than 100nm.
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2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems
June 3–5, 2008
Clear Water Bay, Kowloon, Hong Kong
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4294-0
PROCEEDINGS PAPER
Study on Precision Positioning System of Two-Dimensional Platform Based on High-Speed and Large-Range
Chuan Yang,
Chuan Yang
Xi’an Jiaotong University, Xi’an, China
Search for other works by this author on:
Zhi Zhang
Zhi Zhang
Xi’an Jiaotong University, Xi’an, China
Search for other works by this author on:
Chuan Yang
Xi’an Jiaotong University, Xi’an, China
Zhi Zhang
Xi’an Jiaotong University, Xi’an, China
Paper No:
MicroNano2008-70255, pp. 689-696; 8 pages
Published Online:
June 12, 2009
Citation
Yang, C, & Zhang, Z. "Study on Precision Positioning System of Two-Dimensional Platform Based on High-Speed and Large-Range." Proceedings of the 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. Clear Water Bay, Kowloon, Hong Kong. June 3–5, 2008. pp. 689-696. ASME. https://doi.org/10.1115/MicroNano2008-70255
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