This paper reports the overall picture of our ongoing efforts to establish the scientific understanding of ultrafast, non-equilibrium laser-material interactions from nanometer to milimeter and from femtosecond to microsecond through comprehensive, integrated multiscale physico-chemical modeling and experimental verification. A novel plasma model with quantum treatments is developed to account for significantly varying optical properties. The model is used to successfully predict two uncommon phenomena that is experimentally observed: 1) a flat-bottom crater shape created by a Gaussian beam and 2) repeatable nanoscale structures achieved by pulse train technology. The well known two-temperature model is improved by considering the quantum effects of different heat carriers and then is used to accurately predict the damage thresholds for metals. Preliminary results for these ongoing modeling efforts are reported in this article.
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2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems
June 3–5, 2008
Clear Water Bay, Kowloon, Hong Kong
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4294-0
PROCEEDINGS PAPER
A Combined Model and Its Verification for Femtosecond-Pulse Materials Interactions
Lan Jiang,
Lan Jiang
Beijing Institute of Technology, Beijing, China; Missouri University of Science and Technology, Rolla, MO
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Hai-Lung Tsai
Hai-Lung Tsai
Missouri University of Science and Technology, Rolla, MO
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Lan Jiang
Beijing Institute of Technology, Beijing, China; Missouri University of Science and Technology, Rolla, MO
Hai-Lung Tsai
Missouri University of Science and Technology, Rolla, MO
Paper No:
MicroNano2008-70127, pp. 609-614; 6 pages
Published Online:
June 12, 2009
Citation
Jiang, L, & Tsai, H. "A Combined Model and Its Verification for Femtosecond-Pulse Materials Interactions." Proceedings of the 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. Clear Water Bay, Kowloon, Hong Kong. June 3–5, 2008. pp. 609-614. ASME. https://doi.org/10.1115/MicroNano2008-70127
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