To solve the problem that Various post-treatment technologies were needed to improve the field emission in the current preparation of screen printing carbon nanotubes (CNTs) film, a novel pulping process without post-treatment for screen printing ZnO nanoneedles was presented. Carboxymethyl cellulose (CMC) was used for pulping agent and water was used for dissolvent in this process. The measurement of field emission revealed that the ZnO nanoneedles film prepared by mass ratio 3:5 of ZnO nanoneedles to the paste agent had the lowest turn-on field 2.25V/μm at the current density of 1μA/cm2, and the uniform distribution and great density of luminance points of the ZnO nanoneedles was obtained at the applied field of 4V/μm. This method had a good utility value in the fabrication of ZnO nanoneedles field emission display.
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2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems
June 3–5, 2008
Clear Water Bay, Kowloon, Hong Kong
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4294-0
PROCEEDINGS PAPER
Preparation of Pulp for Screen Printing ZnO Nanoneedles and Field Emission Properties
Ling-Min Yu,
Ling-Min Yu
Xi’an Jiao Tong University; Xi’an Technological University, Xi’an, Shan Xi, China
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Chang-Chun Zhu,
Chang-Chun Zhu
Xi’an Jiao Tong University, Xi’an, Shan Xi, China
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Li-Jun Qi
Li-Jun Qi
Xi’an Technological University, Xi’an, Shan Xi, China
Search for other works by this author on:
Ling-Min Yu
Xi’an Jiao Tong University; Xi’an Technological University, Xi’an, Shan Xi, China
Chang-Chun Zhu
Xi’an Jiao Tong University, Xi’an, Shan Xi, China
Li-Jun Qi
Xi’an Technological University, Xi’an, Shan Xi, China
Paper No:
MicroNano2008-70005, pp. 1-5; 5 pages
Published Online:
June 12, 2009
Citation
Yu, L, Zhu, C, & Qi, L. "Preparation of Pulp for Screen Printing ZnO Nanoneedles and Field Emission Properties." Proceedings of the 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. Clear Water Bay, Kowloon, Hong Kong. June 3–5, 2008. pp. 1-5. ASME. https://doi.org/10.1115/MicroNano2008-70005
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