In this study, the peeling process of UV-curable pressure sensitive adhesive tape from bump wafer is investigated through the use of finite element analysis, observation of high speed video, and actual wafer back-grinding process testing. In our experiment, a large deformation of adhesive is observed at the edge of bottom of bump, appearing on the side of the bump opposite tape-peeling direction when observed with high speed microscope video. The largely deformed adhesive creates a string shaped elongation. The adhesive residue is caused by the fracture of the adhesive string. We investigated how to generate the adhesive string in the tape-peeling process through the use of finite element analysis. In this analysis, a cohesive element is introduced into the adhesive layer. The analytical result shows the adhesive string at the same position of experiment and the stress distribution is different between the string part and the other area of adhesive. The influence of peeling angle and bump size is also investigated by the same finite element model. As a result, higher peeling angle and smaller bump sizes shows a shorter adhesive string, which lowers the risk of adhesive residue.
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ASME 2017 International Technical Conference and Exhibition on Packaging and Integration of Electronic and Photonic Microsystems collocated with the ASME 2017 Conference on Information Storage and Processing Systems
August 29–September 1, 2017
San Francisco, California, USA
Conference Sponsors:
- Electronic and Photonic Packaging Division
ISBN:
978-0-7918-5809-7
PROCEEDINGS PAPER
Investigation of Peeling Behavior of UV Curable Pressure Sensitive Adhesive for Bump-Wafer
Naoya Saiki,
Naoya Saiki
Lintec Corporation, Saitama, Japan
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Yuichiro Komasu,
Yuichiro Komasu
Lintec Corporation, Saitama, Japan
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Kazuto Aizawa,
Kazuto Aizawa
Lintec Corporation, Saitama, Japan
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Jun Maeda
Jun Maeda
Lintec Corporation, Saitama, Japan
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Naoya Saiki
Lintec Corporation, Saitama, Japan
Yuichiro Komasu
Lintec Corporation, Saitama, Japan
Kazuto Aizawa
Lintec Corporation, Saitama, Japan
Jun Maeda
Lintec Corporation, Saitama, Japan
Paper No:
IPACK2017-74010, V001T01A007; 4 pages
Published Online:
October 27, 2017
Citation
Saiki, N, Komasu, Y, Aizawa, K, & Maeda, J. "Investigation of Peeling Behavior of UV Curable Pressure Sensitive Adhesive for Bump-Wafer." Proceedings of the ASME 2017 International Technical Conference and Exhibition on Packaging and Integration of Electronic and Photonic Microsystems collocated with the ASME 2017 Conference on Information Storage and Processing Systems. ASME 2017 International Technical Conference and Exhibition on Packaging and Integration of Electronic and Photonic Microsystems. San Francisco, California, USA. August 29–September 1, 2017. V001T01A007. ASME. https://doi.org/10.1115/IPACK2017-74010
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