GaN is a new and powerful material for photonic devices such as light emitting and laser diodes. On the other hand, optical MEMS technology is attractive for miniaturizing several optical systems. We are studying GaN film grown on Si substrate for the optical MEMS application in order to fabricate monolithic structure. In this paper, the characteristics of GaN film grown on Si substrate by MBE are reported. The growth conditions of GaN layer on Si substrate are studied. The surface morphology of the grown GaN film is measured by electron microscopy and atomic force microscopy. Furthermore, a preliminary grating structure is fabricated for a MEMS application.

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