A precision optical exposure process of lithography has become one of the essential processes to manufacture and develop micro electro mechanical system (MEMS) devices, flat panel display (FPD), and semiconductor. For a typical exposure process for the lithography, a photomask that is often very expensive is required to generate patterns[1]. So it is very inefficient not only in terms of cost but also the time due to the reliance on the photomasks in development. The alternative solution is the maskless lithography system, which does not use photomasks since the patterns are generated by using a digital mirror device (DMD). The unit mirror of a digital mirror device has two kinds of status which are on and off, then the status of unit mirrors configures a pattern called point array method. The maskless lithography system can reduce the amount of work forces significantly and save money as well. However, the maskless lithography system has a critical drawback, which is a low throughput since the patterns are generated in a line. This is an intrinsic problem of point array method. So in most volume production processes of maskless lithography system, a number of optical heads are used in order to maximize throughput of the expositing process. And to guarantee the exposure quality, multiple numbers of optical heads should be accurately aligned to each other, and then the focal plane of each optical head is also well aligned with chuck.
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ASME 2013 Conference on Information Storage and Processing Systems
June 24–25, 2013
Santa Clara, California, USA
Conference Sponsors:
- Information Storage and Processing Systems Division
ISBN:
978-0-7918-5553-9
PROCEEDINGS PAPER
Position Alignment of Micro Manipulator Using Root Mean Square Errors for Maskless Lithography System
Yong Seok Ihn,
Yong Seok Ihn
Sungkyunkwan University, Suwon, Korea
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Sae Whan Park,
Sae Whan Park
Sungkyunkwan University, Suwon, Korea
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Ja Choon Koo
Ja Choon Koo
Sungkyunkwan University, Suwon, Korea
Search for other works by this author on:
Yong Seok Ihn
Sungkyunkwan University, Suwon, Korea
Sae Whan Park
Sungkyunkwan University, Suwon, Korea
Ja Choon Koo
Sungkyunkwan University, Suwon, Korea
Paper No:
ISPS2013-2943, V001T07A013; 3 pages
Published Online:
December 4, 2013
Citation
Ihn, YS, Park, SW, & Koo, JC. "Position Alignment of Micro Manipulator Using Root Mean Square Errors for Maskless Lithography System." Proceedings of the ASME 2013 Conference on Information Storage and Processing Systems. ASME 2013 Conference on Information Storage and Processing Systems. Santa Clara, California, USA. June 24–25, 2013. V001T07A013. ASME. https://doi.org/10.1115/ISPS2013-2943
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