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Keywords: Silicon wafer
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Proceedings Papers

Proc. ASME. IMECE2007, Volume 3: Design and Manufacturing, 517-522, November 11–15, 2007
Publisher: American Society of Mechanical Engineers
Paper No: IMECE2007-44013
... Silicon wafers are the fundamental building blocks for most integrated circuits. Chemical mechanical polishing is used to manufacture silicon wafers as the final material removal process to meet the ever-increasing demand for flatter wafers and lower prices. The polishing pad is one...
Proceedings Papers

Proc. ASME. IMECE2004, Nondestructive Evaluation Engineering, 17-24, November 13–19, 2004
Publisher: American Society of Mechanical Engineers
Paper No: IMECE2004-59195
... 31 03 2008 As a nondestructive measurement method, laser scattering has been preliminarily applied to detect subsurface damage in silicon wafers, but the quantitative correlation between scatter images and subsurface damage depth has not been established yet. In order to assess...
Proceedings Papers

Proc. ASME. IMECE2005, Manufacturing Engineering and Materials Handling, Parts A and B, 893-900, November 5–11, 2005
Publisher: American Society of Mechanical Engineers
Paper No: IMECE2005-80271
... 31 01 2008 Silicon is the primary semiconductor material used to fabricate integrated circuits. The quality of microchips depends directly on the quality of silicon wafers. A series of processes are required to manufacture the high-quality silicon wafers. Chemical mechanical polishing...