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Proceedings Papers

Structural Response of Oxidation Resistant Carbon-Carbon Composites

T. H. Ashley, O. O. Ochoa
Proc. ASME. IMECE96, Aerospace and Materials, 211-220, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-0478
https://doi.org/10.1115/IMECE1996-0478
View Paper titled, Structural Response of Oxidation Resistant Carbon-Carbon Composites
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Topics: Carbon, Composite materials, Oxidation, Laminates, Materials properties, Boron, Chemical vapor deposition, Finite element analysis, Particulate matter, Satin
Proceedings Papers

Mechanism-Based Design of Composite Structures

Slimane Adjerid, Mark W. Beall, George J. Dvorak, Jacob Fish, Joseph E. Flaherty, John Hudson, Kam L. Shek, Mark S. Shephard, Rolf Wentorf
Proc. ASME. IMECE96, Aerospace and Materials, 271-281, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-0485
https://doi.org/10.1115/IMECE1996-0485
View Paper titled, Mechanism-Based Design of Composite Structures
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Topics: Composite materials, Design, Modeling, Computer software, High temperature, Chemical vapor deposition, Crack propagation, Databases, Errors, Fiber reinforced composites
Proceedings Papers

Flow and Heat Transfer Problems in the Semiconductor Manufacturing Processes

Masato Ikegawa
Proc. ASME. IMECE96, Transport Phenomena in Materials Processing and Manufacturing, 183, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-1044
https://doi.org/10.1115/IMECE1996-1044
View Paper titled, Flow and Heat Transfer Problems in the Semiconductor Manufacturing Processes
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Topics: Flow (Dynamics), Heat transfer, Integrated circuit fabrication, Semiconductor wafers, Manufacturing, Particulate matter, Chemical reactions, Chemical vapor deposition, Contamination, Etching
Proceedings Papers

Semiconductor Deposition Profile Simulation Using Direct Simulation Monte Carlo Method

Masato Ikegawa, Jun’ichi Kobayashi, Morihisa Maruko
Proc. ASME. IMECE96, Transport Phenomena in Materials Processing and Manufacturing, 235-242, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-1051
https://doi.org/10.1115/IMECE1996-1051
View Paper titled, Semiconductor Deposition Profile Simulation Using Direct Simulation Monte Carlo Method
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Topics: Monte Carlo methods, Semiconductors (Materials), Simulation, Boundary-value problems, Pressure, Sputter deposition, Chemical vapor deposition, Collisions (Physics), Dimensions, Gas flow
Proceedings Papers

Study of CVD Coated and Uncoated INCO 718 Exposed to Particulate Flow

Vesselin Shanov, Widen Tabakoff, J. A. Gunaraj
Proc. ASME. IMECE96, Transport Phenomena in Materials Processing and Manufacturing, 227-234, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-1050
https://doi.org/10.1115/IMECE1996-1050
View Paper titled, Study of CVD Coated and Uncoated INCO 718 Exposed to Particulate Flow
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Topics: Chemical vapor deposition, Flow (Dynamics), Particulate matter, Erosion, Coatings, Superalloys, Temperature, Alloys, Boilers, Ceramic coatings
Proceedings Papers

The Dynamics of Particle Formation During SiH 4 :O 2 Chemical Vapor Deposition: Implications for Materials Processing

Evan Whitby, Masakazu Hoshino, Masato Ikegawa
Proc. ASME. IMECE96, Transport Phenomena in Materials Processing and Manufacturing, 215-219, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-1048
https://doi.org/10.1115/IMECE1996-1048
View Paper titled, The Dynamics of Particle Formation During SiH 4 :O 2 Chemical Vapor Deposition: Implications for Materials Processing
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Topics: Chemical vapor deposition, Dynamics (Mechanics), Materials processing, Particulate matter, Computer simulation, Pressure, Chemical reactions, Fluid dynamics, Heat transfer, Particle size
Proceedings Papers

On-Line Prediction and Optimization of a CVD Barrel Reactor: An Experimental Study

R. L. Mahajan, K. J. Walker
Proc. ASME. IMECE96, Fluids Engineering, 69-80, November 17–22, 1996
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1996-0956
https://doi.org/10.1115/IMECE1996-0956
View Paper titled, On-Line Prediction and Optimization of a CVD Barrel Reactor: An Experimental Study
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Topics: Chemical vapor deposition, Optimization, Temperature, Artificial neural networks, Flow (Dynamics), Neural network models, Nozzles, Algorithms, Data acquisition systems, Experimental design
Proceedings Papers

Transient Temperature Measurements in a Simulated RTCVD Reactor

J. F. Horton, J. E. Peterson
Proc. ASME. IMECE97, Heat Transfer: Volume 3, 217-224, November 16–21, 1997
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1997-0912
https://doi.org/10.1115/IMECE1997-0912
View Paper titled, Transient Temperature Measurements in a Simulated RTCVD Reactor
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Topics: Temperature measurement, Transients (Dynamics), Temperature, Buoyancy, Density, Semiconductor wafers, Uncertainty, Chemical vapor deposition, Flow (Dynamics), Flow visualization
Proceedings Papers

In Situ Control of Interface Coatings on Fibers Using CVD

John G. Jones, John D. Busbee, Paul D. Jero, David J. Kent, David C. Liptak
Proc. ASME. IMECE97, Composites and Functionally Graded Materials, 379-384, November 16–21, 1997
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1997-0688
https://doi.org/10.1115/IMECE1997-0688
View Paper titled, In Situ Control of Interface Coatings on Fibers Using CVD
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Topics: Chemical vapor deposition, Coatings, Fibers, Ceramic matrix composites, Chemistry, High temperature, Oxidation
Proceedings Papers

Direct Measurement of the Adhesive Fracture Resistance of CVD Diamond Particles

Shoji Kamiya, Hironori Takahashi, Masumi Saka, Hiroyuki Abé
Proc. ASME. IMECE97, Application of Fracture Mechanics in Electronic Packaging, 169-174, November 16–21, 1997
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1997-0513
https://doi.org/10.1115/IMECE1997-0513
View Paper titled, Direct Measurement of the Adhesive Fracture Resistance of CVD Diamond Particles
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Topics: Adhesives, Fracture (Materials), Fracture (Process), Particulate matter, Synthetic diamonds, Chemical vapor deposition, Diamond films, Nucleation (Physics), Stress, Electronics
Proceedings Papers

Preliminary Results of Laser-Assisted Cleaning of Alumina Coated Carbide Tool Inserts

Ajay P. Malshe, Kok E. Khor, Deepak G. Bhat
Proc. ASME. IMECE97, Manufacturing Science and Engineering: Volume 2, 207-212, November 16–21, 1997
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1997-1154
https://doi.org/10.1115/IMECE1997-1154
View Paper titled, Preliminary Results of Laser-Assisted Cleaning of Alumina Coated Carbide Tool Inserts
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Topics: Lasers, Carbide cutting tools, Coating processes, Coatings, Blasting, Chemical vapor deposition, Cobalt, Cutting, Cutting tools, Damage
Proceedings Papers

3-D FEM of Residual Stresses in CVD Diamond-Coated Carbide Cutting Inserts for Process Optimization

Mahmoud A. Taher, William F. Schmidt, Ajay P. Malshe
Proc. ASME. IMECE98, Manufacturing Science and Engineering, 429-438, November 15–20, 1998
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1998-1056
https://doi.org/10.1115/IMECE1998-1056
View Paper titled, 3-D FEM of Residual Stresses in CVD Diamond-Coated Carbide Cutting Inserts for Process Optimization
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Topics: Chemical vapor deposition, Cutting, Diamonds, Finite element model, Optimization, Residual stresses, Coatings, Adhesion, Stress, Synthetic diamonds
Proceedings Papers

Study of Nucleation of Diamond on Silicon Substrate by Ab-Initio Molecular Dynamics

Tomoo Kayaba, Akinori Inoue, Masumi Saka, Hiroyuki Abé
Proc. ASME. IMECE98, Thermo-Mechanical Characterization of Evolving Packaging Materials and Structures, 83-85, November 15–20, 1998
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1998-0432
https://doi.org/10.1115/IMECE1998-0432
View Paper titled, Study of Nucleation of Diamond on Silicon Substrate by Ab-Initio Molecular Dynamics
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Topics: Diamonds, Molecular dynamics, Nucleation (Physics), Silicon, Atoms, Carbon, Chemical vapor deposition, Diamond films, Simulation, Aluminum
Proceedings Papers

Investigation of Induced Thermal and Fluid Transport Phenomena in Laser Assisted Chemical Vapor Deposition

D. Yu, A. B. Duncan
Proc. ASME. IMECE98, Heat Transfer: Volume 4 — Heat Transfer in Materials Processing, 183-191, November 15–20, 1998
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1998-0704
https://doi.org/10.1115/IMECE1998-0704
View Paper titled, Investigation of Induced Thermal and Fluid Transport Phenomena in Laser Assisted Chemical Vapor Deposition
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Topics: Chemical vapor deposition, Fluids, Lasers, Transport phenomena, Chemical reactions, Fibers, Laser beams, Fluid dynamics, Heat transfer, Absorption
Proceedings Papers

Continuously Moving Finite Thickness Susceptor in CVD Processing

Wilson K. S. Chiu, Yogesh Jaluria
Proc. ASME. IMECE98, Heat Transfer: Volume 4 — Heat Transfer in Materials Processing, 209-219, November 15–20, 1998
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1998-0707
https://doi.org/10.1115/IMECE1998-0707
View Paper titled, Continuously Moving Finite Thickness Susceptor in CVD Processing
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Topics: Chemical vapor deposition, Computer simulation, Design, Film thickness, Heat, Heat conduction, Heating, Mass transfer, Silicon, Thermal diffusivity
Proceedings Papers

In-Situ Scanning Electron Microscope Chemical Vapor Deposition as a Platform for Nanomanufacturing Insights

Gordon Koerner, Ramakrishna Surya, Kannappan Palaniappan, Prasad Calyam, Filiz Bunyak, Matthew R. Maschmann
Proc. ASME. IMECE2021, Volume 2B: Advanced Manufacturing, V02BT02A052, November 1–5, 2021
Publisher: American Society of Mechanical Engineers
Paper No: IMECE2021-73554
https://doi.org/10.1115/IMECE2021-73554
View Paper titled, In-Situ Scanning Electron Microscope Chemical Vapor Deposition as a Platform for Nanomanufacturing Insights
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Topics: Carbon nanotubes, Chemical vapor deposition, Nanomanufacturing, Scanning electron microscopes
Proceedings Papers

Detachable Fine Bump Connection Using Multi-Walled Carbon-Nanotube Bundles for 3D Semiconductor Modules

Masasuke Kobayashi, Ken Suzuki, Hideo Miura
Proc. ASME. IMECE2021, Volume 12: Mechanics of Solids, Structures, and Fluids; Micro- and Nano- Systems Engineering and Packaging, V012T13A005, November 1–5, 2021
Publisher: American Society of Mechanical Engineers
Paper No: IMECE2021-70172
https://doi.org/10.1115/IMECE2021-70172
View Paper titled, Detachable Fine Bump Connection Using Multi-Walled Carbon-Nanotube Bundles for 3D Semiconductor Modules
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Topics: Carbon nanotubes, Ohmic contacts, Semiconductors (Materials), Multi-walled carbon nanotubes, Deformation, Silicon, Chemical vapor deposition, Compression, Contact resistance, Electrical properties
Proceedings Papers

Numerical Modeling of Thermal Materials Processing Systems

Yogesh Jaluria
Proc. ASME. IMECE99, Fluids Engineering, 137-148, November 14–19, 1999
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1999-1224
https://doi.org/10.1115/IMECE1999-1224
View Paper titled, Numerical Modeling of Thermal Materials Processing Systems
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Topics: Computer simulation, Materials processing, Boundary-value problems, Casting, Chemical reactions, Chemical vapor deposition, Extruding, Flow (Dynamics), Fluid dynamics, Geometry
Proceedings Papers

Temperature Dependent Thermal Conductivity of Symmetrically Strained Si/Ge Superlattices

Theodorian Borca-Tasciuc, Jianlin Liu, Taofang Zeng, Weili Liu, David W. Song, Caroline D. Moore, Gang Chen, Kang L. Wang, Mark S. Goorsky, Tamara Radetic, Ronald Gronsky
Proc. ASME. IMECE99, Heat Transfer: Volume 3, 117-122, November 14–19, 1999
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1999-1069
https://doi.org/10.1115/IMECE1999-1069
View Paper titled, Temperature Dependent Thermal Conductivity of Symmetrically Strained Si/Ge Superlattices
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Topics: Superlattices, Temperature, Thermal conductivity, Gallium arsenide, Molecular beam epitaxy, Alloys, Bulk solids, Chemical vapor deposition, Dislocation density, Metalorganic chemical vapor deposition
Proceedings Papers

Experimental and Numerical Study of Conjugate Heat Transfer in a Horizontal Channel Heated From Below: Applications to CVD Processing

Wilson K. S. Chiu, Cristy J. Richards, Yogesh Jaluria
Proc. ASME. IMECE99, Heat Transfer: Volume 3, 131-142, November 14–19, 1999
Publisher: American Society of Mechanical Engineers
Paper No: IMECE1999-1071
https://doi.org/10.1115/IMECE1999-1071
View Paper titled, Experimental and Numerical Study of Conjugate Heat Transfer in a Horizontal Channel Heated From Below: Applications to CVD Processing
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Topics: Chemical vapor deposition, Heat transfer, Temperature, Computer simulation, Design, Flow (Dynamics), Temperature distribution, Thin films