Laser assisted maskless micro-deposition (LAMM) is a recently developed technology for deposition of thin films with micro-scale feature sizes. It can be used for deposition of a large number of materials such as, electronic inks/pastes, conductive polymers, insulators, adhesives, and biological materials. This process is a combination of liquid atomization, micro-deposition and laser sintering. The present study is concerned with the process characterization for the deposition of silver thin films on silica. The deposited material is in the form of nano-particles dispersed in liquid, known as nano-past. In the present research work, deposition patterns are produced with different process parameters. Afterwards, the effects of process parameters, e.g., laser power and laser scanning speed, are investigated by examining the quality of the deposited material.

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