Tantalum nitride (TaN) thin films were coated at room temperature (30°C) on carbide turning inserts using DC magnetron sputtering technique. The mechanical properties like adhesion and hardness of these coating have been evaluated by Scratch tester; the thickness is estimated by Ball and Crater method. The properties of the films are studied by X-Ray diffraction (XRD) technique. The Optical Emission Spectroscopy (OES) has been employed to analyze the sputtering plasma to understand the reaction kinetics of tantalum nitride formation. The surface of the substrates: tools, glass and single crystal silicon, has been treated with plasma for better adhesion. A 2 μm thick TaN was deposited on the turning inserts. The coated inserts withstood a load of 20 N. The preliminary results reported are quite encouraging.

1.
Rointan F. Bunshsh and Donald M. Mattox, Deposition Technologies for Films and Coatings-Developments and Applications, Noyes Pub., New Jersey, USA (1982)
2.
K. Radhakrishnan, Ng Geok Ing, R. Gopalakrishnan, Reactive sputter deposition and characterization of tantalum nitride thin films, Materials Science and Engineering B57 (1999) 224–227.
3.
Y.M. Lu, R.J. Weng, W.S. Hwang and Y.S. Yang, Study of phase transition and electrical resistivity of tantalum nitride films prepared by DC magnetron sputtering with OES detection system, Thin Solid Films, 398–399 (2001) 356.
4.
Nakano
Takeo
,
Ohnuki
Noriyuki
,
Baba
Shigeru
,
Pressure dependence of optical emission from DC magnetron sputtering plasma observed with spatial resolution
,
Vacuum
59
(
2000
)
581
585
.
5.
H.R. Griem, Plasma Spectroscopy, McGraw-Hill, New York (1964), p. 129.
6.
K.D. Mittal (ed.), Adhesion measurement of thin films, thick films and bulk coatings, Am. Soc. For testing materials (1978).
This content is only available via PDF.
You do not currently have access to this content.