In this paper, a novel method to realize three-dimensional microstructures is presented. The presented technology is based on a direct write technique using a scanning laser system to pattern thick-film SU-8. This technique combines the best features of photolithography techniques in multi-layer processing with the versatility of existing 3D prototyping technologies. It enables laser pulsing spot-by-spot for both in-plane and in-depth processing. The results presented here represent the first step towards the realization of categories of MEMS devices with mechanical, optical, and/or biological functionalities.

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