A new methodology using very low energy Ar ion irradiation is proposed to improve the mechanical properties of thin metal films deposited by sputtering. In this study, accelerating voltage of Ar ion plasma was set to lower than 100V, and several conditions were applied to irradiations. Consequently, it is found that Young’s modulus and hardness of Aluminum and Nickel thin film increases about 10% by the irradiation compared with a non-irradiated thin film. (111)–oriented integrated intensity of diffraction of Al and Ni thin film was increased by the irradiation. It is considered that crystalline orientation was changed and column spacing of the film be filled by the irradiation. It is shown that the proposed technique is effective to improve the mechanical properties of metal thin films with proper irradiation conditions.

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