A binary monolayer on an elastic substrate may self-organize into ordered nanoscale patterns. Here we report a work of using a substrate strain field to guide the self-assembly process. The study shows that straining a substrate uniformly does not influence the pattern. However, a non-uniform strain field significantly influences the size, shape and distribution of self-assembled features. The study suggests a method of strain field design to make various monolayer patterns.
Engineering Monolayers With Strain Field
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Kim, D, & Lu, W. "Engineering Monolayers With Strain Field." Proceedings of the ASME 2004 International Mechanical Engineering Congress and Exposition. Materials. Anaheim, California, USA. November 13–19, 2004. pp. 101-105. ASME. https://doi.org/10.1115/IMECE2004-59999
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