In this paper we investigate the tolerances required to achieve high transmission efficiencies given two planar waveguides with misalignments in both offset and overlap. More specifically, simulations of two types of waveguides, embedded and deep-ridge, with defects created during a multi-exposure lithographic process are presented along with statistical analyses results. Average efficiencies as high as 99% can be achieved with both waveguides having misalignment deviations in position as great as 0.3 μm. Overlap misalignment in the regime we explored was found to be much less critical for the planar waveguide coupling.

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