Frictional characteristics of mesoporous SiO2 thin films were evaluated with different pore sizes. The films were manufactured by sol-gel and self-assembly methods to have a porous structure. The pores on the surface may play as the outlet of wear particle and the storage of lubricant so that the surface interactions could be improved. The pores were exposed on the surface by chemical mechanical polishing (CMP) or plasma-etching after forming the porous films. The ball-on-disk tests with mesoporous SiO2 thin films on glass specimen were conducted at sliding speed of 15rpm and a load of 0.26N. The results show considerable dependency of friction on pore size of mesoporous SiO2 thin films. The friction coefficient decreased as increasing the pore size. CMP process was very useful to expose the pores on the surface.

Volume Subject Area:
Tribomaterials
Topics:
Self-assembly, Sol-gel processing, Thin films, Friction, Disks, Glass, Lubricants, Particulate matter, Plasma etching, Polishing, Storage, Stress, Wear
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Copyright © 2007
 by ASME
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