Contact Aided Compliant Mechanisms (CCMs) are synthesized via the Material Mask Overlay Strategy (MMOS) to trace a desired non-smooth path. MMOS employs hexagonal cells to discretize the design region and engages negative circular masks to designate material states. To synthesize CCMs, the modified MMOS presented herein involves systematic mutation of five mask parameters through a hill climber search to evolve not only the continuum topology (slave surfaces), but also, to introduce the desired rigid, interacting surfaces within some masks. Various geometric singularities are subdued via hexagonal cells though numerous V-notches get retained at the continuum boundaries. To facilitate contact analysis, boundary smoothing is performed by shifting boundary nodes of the evolving continuum systematically. Numerous hexagonal cells get morphed into concave sub-regions as a consequence. Large deformation finite element formulation with Mean Value Coordinates (MVC) based shape functions is used to cater to the generic hexagonal shapes. Contact analysis is accomplished via the Newton-Raphson iterations with load increment in conjunction with the penalty method and active set constraints. An objective function based on Fourier Shape Descriptors is minimized subject to suitable design constraints. An example of a path generating CCM is included to establish the efficacy of the proposed synthesis method.
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ASME 2015 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference
August 2–5, 2015
Boston, Massachusetts, USA
Conference Sponsors:
- Design Engineering Division
- Computers and Information in Engineering Division
ISBN:
978-0-7918-5712-0
PROCEEDINGS PAPER
On Synthesis of Contact Aided Compliant Mechanisms Using the Material Mask Overlay Method
Prabhat Kumar,
Prabhat Kumar
Indian Institute of Technology Kanpur, Kanpur, India
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Roger A. Sauer,
Roger A. Sauer
RWTH Aachen University, Aachen, Germany
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Anupam Saxena
Anupam Saxena
Indian Institute of Technology Kanpur, Kanpur, India
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Prabhat Kumar
Indian Institute of Technology Kanpur, Kanpur, India
Roger A. Sauer
RWTH Aachen University, Aachen, Germany
Anupam Saxena
Indian Institute of Technology Kanpur, Kanpur, India
Paper No:
DETC2015-47064, V05AT08A017; 9 pages
Published Online:
January 19, 2016
Citation
Kumar, P, Sauer, RA, & Saxena, A. "On Synthesis of Contact Aided Compliant Mechanisms Using the Material Mask Overlay Method." Proceedings of the ASME 2015 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. Volume 5A: 39th Mechanisms and Robotics Conference. Boston, Massachusetts, USA. August 2–5, 2015. V05AT08A017. ASME. https://doi.org/10.1115/DETC2015-47064
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