Polymerization shrinkage and thermal cooling effect have been identified as two major factors leading to the curl distortion in the Stereolithography (SLA) process. In this paper, the curing temperatures of built layers in the mask image projection based Stereolithography (MIP-SL) process are investigated using a high-resolution infrared (IR) camera. The curing temperatures of built layers using different exposure strategies including varying exposure time, grayscale levels and mask image patterns have been studied. The curl distortions of a test case based on various exposure strategies have been measured and analyzed. It is shown that, by decreasing the curing temperature of built layers, the exposure strategies using grayscale levels and mask image patterns can effectively reduce the curl distortion. In addition to curl distortion control, the curing temperature study also provides a basis for the curl distortion simulation in the MIP-SL process.

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