With advancements in nanotechnology and the continuing reduction of the minimum feature size in integrated-circuit technologies, there is a need for next-generation lithography (NGL) tools. The direct transfer of grating structures stitched from interference lithography to a mold for nano imprinting offers a low-cost alternative for printing sub-100nm features with great potential accuracy, high resolution, and reductivity. This research presents dual stage laser-interferometer equipment to meet these requirements. In moving forward to the stitching of a small interference area, the most important issue is alignment. If the period of this interference fringe can be guaranteed, the stage can be moved in chronological alignment with the period. This paper also presents SEM results of stitching of a 600nm periodic structure.

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