Maskless patterning techniques are increasingly implemented in semiconductor research and manufacturing eliminating the need for costly masks or masters. Recent application of these techniques to DNA and cell patterning demonstrates the adaptability of maskless processes. In this paper we present a new lithographic process for dynamically reconfiguring and arbitrarily positioning computer-generated patterns through the use of phase holograms. Similar to current maskless patterning methods this process can achieve pattern transfer through serially tracing an image onto a substrate. The novelty of our process, however, lies in the ability to rapidly fabricate complex micro/nanoscale structures through single-shot exposure of a substrate.
- Design Engineering Division and Computers and Information in Engineering Division
Dynamic Maskless Holographic Lithography
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Jenness, NJ, Wulff, KD, Johannes, MS, Cole, DG, & Clark, RL. "Dynamic Maskless Holographic Lithography." Proceedings of the ASME 2007 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. Volume 3: 19th International Conference on Design Theory and Methodology; 1st International Conference on Micro- and Nanosystems; and 9th International Conference on Advanced Vehicle Tire Technologies, Parts A and B. Las Vegas, Nevada, USA. September 4–7, 2007. pp. 977-984. ASME. https://doi.org/10.1115/DETC2007-35164
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