Nano-imprinting lithography (NIL) has been developed over 15 years and has shown its great potentials for nanopatterning and nano-fabrication. In this paper, new ideas on improving current nano-imprinting methods have been proposed and preliminary experimental tests are carried out. These proposed nano-imprinting methods are all based on the utilization of pulsed laser sources, either in UV or IR region, and can be easily implemented into a roller-based configuration, which is more effective and much faster than conventional planar type nano-imprinting methods. First of all, based on the Laser Assisted Direct Imprinting (LADI) method proposed in 2002, a modified roller-based LADI method is developed by applying a cylindrical quartz roller for mechanically loading as well as for optically focusing of a deep UV laser beam into a line. This modification not only fulfills a continuous type of LADI process but also more efficiently utilizes the laser energy so that large-area LADI is possible. Experimental testing demonstrates an imprinting rate of 3∼10 cm2/min. Secondly, a new nano-imprinting lithography based on pulsed infrared laser heating is proposed and demonstrated. It utilizes the partial transparency of silicon crystals at IR spectrum to heat up the photo-resist layer. Possible improvements and applications on this IR-NIL will be addressed. Finally, a new method of direct contact printing and patterning of a thin metal film on silicon substrate based on the idea of nano-imprinting is presented. This method combines the effects of loaded contact pressure and IR pulsed laser heating at the metal-film/substrate interface to form a stronger bonding between them, and therefore complete the direct pattern transferring of metal film on substrate. Good experimental results are observed and possible applications will be discussed.

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